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Hard IP Core Nondestructive Testing Technology
Authors: Kun Yu, Hua Wang
Institution:Sino IC Technology Co, ., Ltd, ., Shanghai
Keywords:hard IP core;system on chip (SOC);testing technology;evaluation circuit;memory;automatic test equipment (ATE)
doi:10.33079/jomm.19020201
Volume 2, Issue 2: 19020201, 2019 | PDF
Research Article
Published: June 10, 2019
Views:39
Abstract: Based on the analysis of the existing hard IP core testing technology, the hard IP core nondestructive testing technology was studied, according to the verification requirements of a large number o...
Volume 2, Issue 1: 19020105, 2019 | PDF
Research Article
Published: March 29, 2019
Views:6084
Laser-Driven Light Sources for Nanometrology Applications
Authors: Huiling Zhu, Paul Blackborow
Institution:Energetiq Technology, Inc, ., 7, Constitution Way, Woburn
Keywords:laser-driven;brightness;broadband;deep-UV;metrology;LDLS
doi:10.33079/jomm.19020104
Volume 2, Issue 1: 19020104, 2019 | PDF
Research Article
Published: March 27, 2019
Views:204
Abstract: Laser-driven light sources (LDLS) have ultrahigh-brightness and broad wavelength range. They are ideal radiation sources for optical metrology tools for advanced process control in semiconductor ma...
The Variables and Invariants in the Evolution of Logic Optical Lithography Process
Authors: Qiang Wu
Institution:Shanghai IC R, &, D Center, Shanghai
Keywords:image projection photolithography;imaging contrast;exposure latitude;mask error factor;linewidth uniformity;chemically amplified photoresist;phase shifting mask;optical proximity correction;and photoacid diffusion length
doi:10.33079/jomm.19020101
Volume 2, Issue 1: 19020101, 2019 | PDF
Research Article
Published: Feb. 20, 2019
Views:329
Abstract: Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new techno...
Hamamatsu’s Products for Optical Inspection, Metrology and Monitoring to Improve Yield and Accuracy for Semiconductor Processes
Authors: Chenghao Xiang, Xusheng Zhou
Institution:Hamamatsu Photonics (China) Co., Ltd., Beijing
Keywords:optical semiconductor inspection/metrology/monitoring solutions;image sensor;light sources;mini-spectrometer;photomultiplier tubes/modules
doi:10.33079/jomm.19020102
Volume 2, Issue 1: 19020102, 2019 | PDF
Research Article
Published:
Views:222
Abstract: Pursuing small critical dimensions (i.e. 14 nm or below) and high integration bring us lots of physical defects causing low yield and functionality failures for foundries. Under this circumstance, ...