Welcome to Journal of Microelectronic Manufacturing!
Volume 3, Issue 3
  • Published: Oct. 29, 2020
  • Supervised by:None
  • Hosted by:None
  • Published by:JoMM Editorial Office


Recent Progress of the Integrated Circuit Industry in China ― Overview of the Manufacturing Industry
Authors: Litho World
Keywords:IC Industry;Manufacturing Industry
Issue 3: 20030304, 2020 | PDF
Published: Oct. 8, 2020
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...

Research Article top

Study on Simulation and Profile Prediction of Atomic Layer Deposition
Authors: Lei Qu, Chen Li, Jiang Yan et al.
Institution:North China University of Technology
Keywords:Atomic Layer Deposition;process simulation;profile model;temperature fitting;film of HfO2
Issue 3: 20030303, 2020 | PDF
Research Article
Published: Oct. 8, 2020
Abstract: The Atomic Layer Deposition process (ALD) is widely used in FinFET, 3D-NAND and other important technologies because of its self-limiting signature and low growth temperature. In recent years, the ...
Recognition and Visualization of Lithography Defects based on Transfer Learning
Authors: Bo Liu, Pengzheng Gao, Libin Zhang et al.
Institution:School of Information, North China University of Technology, Beijing
Keywords:transfer learning;neural network;lithography defects;visualize;Grad-CAM
Issue 3: 20030302, 2020 | PDF
Research Article
Published: Oct. 5, 2020
Abstract: Yield control in the integrated circuit manufacturing process is very important, and defects are one of the main factors affecting chip yield. As the process control becomes more and more critical ...
Study of Inverse Lithography Approaches based on Deep Learning
Authors: Xianqiang Zheng, Xu Ma, Shengen Zhang et al.
Institution:Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, China
Keywords:Computational lithography;inverse lithography technology (ILT);optical proximity correction (OPC);deep learning
Issue 3: 20030301, 2020 | PDF
Research Article
Published: Oct. 7, 2020
Abstract: Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable o...