TY - JOUR Xuelong Shi; Yan Yan; Tao Zhou; Xueru Yu; Chen Li; Shoumian Chen; Yuhang ZhaoT1 - Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN JO - Journal of Microelectronic Manufacturing VL - 3 Y1 - 2020/12/30 UR - http://www.jommpublish.org/p/55/63/ L1 - http://www.jommpublish.org/jomm_data/publish/AE/8D/1D/694BA8416395E763FCA39ADEC1/10.33079.jomm.20030407.pdf DO - 10.33079/jomm.20030407 ER -