TY - JOUR Xianqiang Zheng; Xu Ma; Shengen Zhang; Yihua Pan; Gonzalo R. ArceT1 - Study of Inverse Lithography Approaches based on Deep Learning JO - Journal of Microelectronic Manufacturing VL - 3 Y1 - 2020/10/07 UR - http://www.jommpublish.org/p/183/55/ L1 - http://www.jommpublish.org/jomm_data/publish/3A/45/7A/61CEBE40ABA5C3436072C97E36/10.33079.jomm.20030301_EEQnFIC.pdf DO - 10.33079/jomm.20030301 ER -