TY - JOUR Yushu Yang; Yanli Li; Qiang Wu; Jianjun Zhu; Shoumian ChenT1 - Key Process Approach Recommendation for 5 nm Logic Process Flow with EUV Photolithography JO - Journal of Microelectronic Manufacturing VL - 3 Y1 - 2020/03/30 UR - http://www.jommpublish.org/p/183/48/ L1 - http://www.jommpublish.org/jomm_data/publish/C5/79/B9/298BB64361AE21613A67825B1F/10.33079.jomm.20030103.pdf DO - 10.33079/jomm.20030103 ER -