TY - JOUR Du Zhang; Yu-Hao Tsai; Hojin Kim; Mingmei WangT1 - Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study JO - Journal of Microelectronic Manufacturing VL - 2 Y1 - UR - http://www.jommpublish.org/p/183/24/ L1 - http://www.jommpublish.org/jomm_data/publish/73/7D/5D/F40B7A4DF2BDF6FFD82C6D7CC7/10.33079.jomm.19020103.pdf DO - 10.33079/jomm.19020103 ER -