TY - JOUR Yijiang Shen; Zhenrong ZhangT1 - Variational Level-set Formulation for Lithographic Source and Mask Optimization JO - Journal of Microelectronic Manufacturing VL - 1 Y1 - 2018/12/20 UR - http://www.jommpublish.org/p/183/19/ L1 - http://www.jommpublish.org/jomm_data/publish/46/1C/C4/3AB4B74A528BDFEF15854266BA/10.33079.jomm.18010203.pdf DO - 10.33079/jomm.18010203 ER -